Tania Henry

Ion beam etch for the patterning of advanced absorber materials for EUV masks

Katrina Rook, Vincent Ip, Meng Lee, 2019, Photomask Japan.

Optimization of ion-beam-deposited Mo/Si multilayers for extreme ultraviolet masks

Kenji Yamamoto, Katrina Rook, Narasimhan Srinivasan, 2021 .