T. Aota

Characterization of extreme ultraviolet emission from tin-droplets irradiated with Nd:YAG laser plasmas

Kunioki Mima, Noriaki Miyanaga, Hiroaki Nishimura, 2008, SPIE Advanced Lithography.

Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions

Hiroaki Nishimura, Yoshinori Shimada, Keiji Nagai, 2008, SPIE Advanced Lithography.

Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production

Kunioki Mima, Noriaki Miyanaga, Hiroaki Nishimura, 2008 .

Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma

Kunioki Mima, Noriaki Miyanaga, Hiroaki Nishimura, 2008 .

Space‐resolving flat‐field vacuum ultraviolet spectrograph for plasma diagnostics

A. Mase, Naohiro Yamaguchi, T. Aota, 1994 .

Development of EUV light source by laser-produced plasma

Hiroyuki Furukawa, Hiroaki Nishimura, Shigeaki Uchida, 2006 .

Study of a cavity-confined plasma as a debris-less and high conversion efficiency source for EUV lithography

H. Yashiro, T. Tomie, T. Aota, 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).