Theodore H. Fedynyshyn

PAG segregation during exposure affecting innate material roughness

Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral, 2009, Advanced Lithography.

Encapsulated inorganic resist technology

Scott P. Doran, Theodore H. Fedynyshyn, Michele L. Lind, 2000, Advanced Lithography.

Sensitivity of EUV resists to out-of-band radiation

Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral, 2009, Advanced Lithography.

PAG segregation during exposure affecting innate material roughness

Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral, 2007, SPIE Advanced Lithography.

Encapsulated inorganic resist technology applied to 157-nm lithography

Roger F. Sinta, Michael Sworin, Scott P. Doran, 2001, SPIE Advanced Lithography.

Electron-beam directed materials assembly

Theodore H. Fedynyshyn, Russell B. Goodman, Richard P. Kingsborough, 2010, Advanced Lithography.

Characterization and modeling of a positive-acting chemically amplified resist

James W. Thackeray, Roger F. Sinta, Daniel A. Miller, 1995, Advanced Lithography.