Samuel Kvasnica

eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, Photomask Japan.

eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, Photomask Technology.

Multibeam Ablenkarray Institution for maskless particle-beam processing

Elmar Platzgummer, Reinhard Springer, Florian Letzkus, 2008 .

Lorentz force based magnetic field sensor with optical readout

Franz Keplinger, Franz Kohl, Artur Jachimowicz, 2004 .