Daniel Schondelmaier

First results in patterning of ultra high aspect ratio microstructures by a 4T wave length shifter at BESSY

Alexander Barth, Martin Bednarzik, Bernd Loechel, 2003, Proceedings International Conference on MEMS, NANO and Smart Systems.

Cost-effective masks for deep x-ray lithography

Jost Goettert, Linke Jian, Yohannes M. Desta, 2003, SPIE Microtechnologies.

Orientation and Self-Assembly of Hydrophobic Fluoroalkylsilanes

Daniel Schondelmaier, S. Cramm, W. Eberhardt, 2002 .

Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique

Gabi Gruetzner, Martin Bednarzik, Josef Mathuni, 2008 .