Stefan Flachowsky

Invited) Integration Challenges of Ferroelectric Hafnium Oxide Based Embedded Memory

Stefan Slesazeck, Halid Mulaosmanovic, Thomas Mikolajick, 2015 .

Correlation between the macroscopic ferroelectric material properties of Si:HfO2 and the statistics of 28 nm FeFET memory arrays

S. Henker, Stefan Slesazeck, Thomas Mikolajick, 2016 .

Detailed simulation study of embedded SiGe and Si:C source/drain stressors in nanoscaled silicon on insulator metal oxide semiconductor field effect transistors

Manfred Horstmann, Ralf Illgen, Tom Herrmann, 2010 .

Doped Hafnium Oxide – An Enabler for Ferroelectric Field Effect Transistors

Stefan Slesazeck, Thomas Mikolajick, Uwe Schröder, 2014 .

Understanding Strain-Induced Drive-Current Enhancement in Strained-Silicon n-MOSFET and p-MOSFET

Manfred Horstmann, Ralf Illgen, Tom Herrmann, 2010, IEEE Transactions on Electron Devices.

Gate length scaling trends of drive current enhancement in CMOSFETs with dual stress overlayers and embedded-SiGe

Manfred Horstmann, Ralf Illgen, Tom Herrmann, 2008 .