Yuansheng Ma

发表

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, Advanced Lithography.

Direct extraction of semiconductor device parameters using lateral optimization method

F. J. Garcia Sanchez, Adelmo Ortiz-Conde, Yuansheng Ma, 1999 .

Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements?

Yongan Xu, Chi-Chun Liu, Yuansheng Ma, 2015, Advanced Lithography.

Machine learning based wafer defect detection

Qian Xie, Feng Wang, Yuansheng Ma, 2019, Advanced Lithography.

Lithography and design integration — New paradigm for the technology architecture development

Lei Yuan, Yunfei Deng, Harry J. Levinson, 2012, Proceedings of the IEEE 2012 Custom Integrated Circuits Conference.

Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with Lamella DSA for sub-7 nm technology

Joydeep Mitra, Germain Fenger, Yuansheng Ma, 2017, Advanced Lithography.

Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, European Mask and Lithography Conference.

Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

David Z. Pan, Joydeep Mitra, Andres Torres, 2018 .

Considerations in source-mask optimization for logic applications

Yunfei Deng, Harry J. Levinson, Jongwook Kye, 2010, Advanced Lithography.

Model-assisted template extraction SRAF application to contact holes patterns in high-end flash memory device fabrication

Se-Young Oh, Daejin Park, Hyoung-Soon Yune, 2018, Advanced Lithography.

Spacer defined double patterning for sub-72 nm pitch logic technology

Harry J. Levinson, Greg McIntyre, Yuansheng Ma, 2010, Advanced Lithography.

Calibration and application of a DSA Compact model for graphoepitaxy hole processes using contour-based metrology

Geert Vandenberghe, J. Andres Torres, Yuri Granik, 2014, Photomask Technology.

Decomposition strategies for self-aligned double patterning

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2010, Advanced Lithography.

Overview and development of EDA tools for integration of DSA into patterning solutions

J. Andres Torres, Joydeep Mitra, Yuri Granik, 2017, 2017 18th International Symposium on Quality Electronic Design (ISQED).

Model-based guiding pattern synthesis for on-target and robust assembly of via and contact layers using DSA

David Z. Pan, Joydeep Mitra, Andres Torres, 2017, Advanced Lithography.

Reduction of systematic defects with machine learning from design to fab

Germain Fenger, James Word, Yuansheng Ma, 2020, Advanced Lithography.

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Neal Lafferty, Germain Fenger, Yuansheng Ma, 2015, Advanced Lithography.

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

J. Andres Torres, Yuri Granik, Germain Fenger, 2014, European Mask and Lithography Conference.

Directed self-assembly graphoepitaxy template generation with immersion lithography

Neal Lafferty, Germain Fenger, Yuan He, 2015 .

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

Yunfei Deng, David Z. Pan, Harry J. Levinson, 2010, Advanced Lithography.

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Harry J. Levinson, Bruno La Fontaine, Yuansheng Ma, 2007, SPIE Advanced Lithography.

Overview and development of EDA tools for integration of DSA into patterning solutions

J. Andres Torres, Joydeep Mitra, Yuri Granik, 2017, 2017 18th International Symposium on Quality Electronic Design (ISQED).

Incorporating DSA in multipatterning semiconductor manufacturing technologies

Puneet Gupta, Joydeep Mitra, Yasmine Badr, 2015, Advanced Lithography.

Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

Yan Wang, Joydeep Mitra, Germain Fenger, 2016, SPIE Advanced Lithography.

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

Yan Wang, Joydeep Mitra, Germain Fenger, 2016 .

Combinational optical rule check on hotspot detection

Shumay Shang, Hongxin Zhang, Yuansheng Ma, 2018, Advanced Lithography.

Proposal for determining exposure latitude requirements

Harry J. Levinson, Rolf Seltmann, Bruno La Fontaine, 2008, SPIE Advanced Lithography.

Line edge roughness impact on critical dimension variation

Harry J. Levinson, Yuansheng Ma, Thomas Wallow, 2007, SPIE Advanced Lithography.

Optimizing curvilinear ILT recipe development with machine learning based pattern selection

Le Hong, Keisuke Mizuuchi, Yuansheng Ma, 2021, Photomask Technology.

Line edge roughness and photoresist percolation development model

Franco Cerrina, Yuansheng Ma, Jangho Shin, 2003 .

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations

David Z. Pan, Harry J. Levinson, Yongchan Ban, 2010 .

Line edge roughness of sub-100 nm dense and isolated features: Experimental study

Franco Cerrina, Yuansheng Ma, G. Tsvid, 2003 .