Chin-Lung Lin

Postexposure baking-temperature effect on resist profile with bottom antireflective coating

Chang-Ming Dai, Chin-Lung Lin, She-Chang Tai, 1996, Advanced Lithography.

Improvement of OPC accuracy for 65nm node contact using KIF

Chin-Lung Lin, Te Hung Wu, Chuen Huei Yang, 2006, SPIE Advanced Lithography.

Using Watermarks and Offline DRM to Protect Digital Images in DIAS

Chin-Lung Lin, Hsiang-An Wang, Hsin-Yu Chen, 2007, ECDL.

Lithographic performance at 0.3- to 0.35-um patterns by using i-line stepper with off-axis illumination technology

Chang-Ming Dai, Chin-Lung Lin, Chih-Yung Lin, 1996, Advanced Lithography.

高科技產業系統均衡策略之實證研究，以臺灣專利法律紛爭解決途徑為例。;The Equilibrium Strategies of High -Tech Industrial System: An Empirical Research of Taiwan’s Patent Disputes Solutions

Chin-Lung Lin, 林金龍, 2012 .