Toshiya Kotani

发表

Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control

Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, 2013, 2013 18th Asia and South Pacific Design Automation Conference (ASP-DAC).

A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation

Chikaaki Kodama, Toshiya Kotani, Shigeki Nojima, 2016, ISPD.

Design intent utilization for lithography compliance check and layout refinement to improve manufacturability

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2011, 2011 e-Manufacturing & Design Collaboration Symposium & International Symposium on Semiconductor Manufacturing (eMDC & ISSM).

Hot spots prediction after etching process based on defect rate

Toshiya Kotani, Taiki Kimura, Yuki Watanabe, 2015, Advanced Lithography.

Full-Chip Layout Optimization for Process Margin Enhancement Using Model-Based Hotspot Fixing System

Soichi Inoue, Toshiya Kotani, Koji Nakamae, 2010 .

Study of practical TAT reduction approaches for EUV flare correction

Toshiya Kotani, Ryoichi Inanami, Suigen Kyoh, 2010, Advanced Lithography.

Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 1999, Advanced Lithography.

Self-aligned quadruple patterning-aware routing

Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, 2014, Advanced Lithography.

Development of hot spot fixer (HSF)

Soichi Inoue, Toshiya Kotani, Atsuhiko Ikeuchi, 2006, SPIE Advanced Lithography.

Development of computational spacer patterning technology

Soichi Inoue, Toshiya Kotani, Shoji Mimotogi, 2010, Photomask Japan.

Lithography oriented DfM for 65 nm and beyond

Soichi Inoue, Toshiya Kotani, Atsuhiko Ikeuchi, 2006, SPIE Advanced Lithography.

Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2002, SPIE Advanced Lithography.

Hotspot detection using image pattern recognition based on higher-order local auto-correlation

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2011, Advanced Lithography.

Development of practical flare correction tool for full chip in EUV lithography

Toshiya Kotani, Hiromitsu Mashita, Taiga Uno, 2012, Advanced Lithography.

Subresolution Assist Feature Generation With Supervised Data Learning

Chikaaki Kodama, Toshiya Kotani, Shigeki Nojima, 2018, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

New process proximity correction using neural network in spacer patterning technology

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2003, Photomask Japan.

Impact of OPC aggressiveness on mask maufacturability

Soichi Inoue, Toshiya Kotani, Ichiro Mori, 2003, Photomask Japan.

Hotspot detection based on surrounding optical feature

Toshiya Kotani, Shigeki Nojima, Fumiharu Nakajima, 2018, Advanced Lithography.

Automated hot-spot fixing system applied for metal layers of 65 nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2006, Photomask Japan.

Fast source optimization by clustering algorithm based on lithography properties

Nozomu Togawa, Masao Yanagisawa, Toshiya Kotani, 2015, Advanced Lithography.

Automated hot-spot fixing system applied to the metal layers of 65-nm logic devices

Soichi Inoue, Toshiya Kotani, Suigen Kyoh, 2007 .

Robust PPC and DFM methodology for exposure tool variations

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2008, SPIE Advanced Lithography.

Automatic layout feature extraction for lithography hotspot detection based on deep neural network

Toshiya Kotani, Shigeki Nojima, Tetsuaki Matsunawa, 2016, SPIE Advanced Lithography.

Mask quality assurance in cleaning for haze elimination using flexible mask specifications

Shinji Yamaguchi, Osamu Ikenaga, Toshiya Kotani, 2007, Photomask Japan.

Hotspot management and its applications in ultralow k1 lithography

Eiji Yamanaka, Soichi Inoue, Kohji Hashimoto, 2009 .

Self-aligned double and quadruple patterning layout principle

Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, 2012, Advanced Lithography.

Lithography simulation system for total CD control from design to manufacturing

Soichi Inoue, Hirotaka Ichikawa, Toshiya Kotani, 2005, SPIE Advanced Lithography.

Novel OPC and DfM methodology for 3D memory device

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2009, Photomask Japan.

Novel fine-tuned model-based SRAF generation method using coherence map

Soichi Inoue, Chikaaki Kodama, Toshiya Kotani, 2010, Advanced Lithography.

Configurable hot spot fixing system

Toshiya Kotani, Sachiko Kobayashi, Hiromitsu Mashita, 2014, Advanced Lithography.

Multi-criteria hotspot detection using pattern classification

Toshiya Kotani, Shigeki Nojima, Tetsuaki Matsunawa, 2019, Advanced Lithography.

Source and mask optimization to mitigate hotspots in etch process

Toshiya Kotani, Taiki Kimura, Kazuyuki Masukawa, 2013, Advanced Lithography.

Robust SMO methodology for exposure tool and mask variations in high volume production

Toshiya Kotani, Shigeki Nojima, Kazuyuki Masukawa, 2013, Advanced Lithography.

Tool-induced hotspot fixing flow for high volume products

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2008, Photomask Japan.

Pattern shape comparison methods using SEM image

Toshiya Kotani, Takashi Sato, Takahiro Ikeda, 2003, SPIE Advanced Lithography.

Validation of process cost effective layout refinement utilizing design intent

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2011, Advanced Lithography.

Yield-enhanced layout generation by new design for manufacturability (DfM) flow

Soichi Inoue, Toshiya Kotani, Shigeki Nojima, 2004, SPIE Advanced Lithography.

Self-aligned quadruple patterning-compliant placement

Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, 2015, Advanced Lithography.

Detailed routing with advanced flexibility and in compliance with self-aligned double patterning constraints

Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, 2013, Advanced Lithography.

Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System

Soichi Inoue, Kohji Hashimoto, Toshiya Kotani, 2009 .

Self-Aligned Double and Quadruple Patterning Aware Grid Routing Methods

Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, 2015, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

Accuracy of mask pattern contour extraction with fine-pixel SEM images

Eiji Yamanaka, Toshiya Kotani, Masamitsu Itoh, 2007, SPIE Photomask Technology.

Process window aware layout optimization using hot spot fixing system

Soichi Inoue, Toshiya Kotani, Sachiko Kobayashi, 2007, SPIE Advanced Lithography.

Exposure source optimization by clustering for lithography

Nozomu Togawa, Masao Yanagisawa, Toshiya Kotani, 2014 .

Optimal setting strategy for kernel-based OPC simulation engines

Soichi Inoue, Toshiya Kotani, Satoshi Tanaka, 2009, Advanced Lithography.

Tandem process proximity correction method

Kohji Hashimoto, Soichi Inoue, Toshiya Kotani, 2002, SPIE Advanced Lithography.

Optical proximity correction feature extraction method using reticle scanning electron microscope images

Osamu Ikenaga, Toshiya Kotani, Takahiro Ikeda, 2003 .