Hayden R. Alty

Using 3D Monte Carlo simulation to develop resists for next-generation lithography

Hayden R. Alty, Scott M. Lewis, Stephen G. Yeates, 2018, Photomask Technology.

Design and implementation of the next generation electron beam resists for the production of EUVL photomasks

Stephen G. Yeates, Sang Kook Lee, Scott M. Lewis, 2018, Photomask Technology.

Plasma-etched pattern transfer of sub-10 nm structures using a metal-organic resist and helium ion beam lithography.

Hayden R. Alty, A. Scherer, R. Winpenny, 2019, Nano letters.

Use of Supramolecular Assemblies as Lithographic Resists.

Hayden R. Alty, A. Scherer, F. Schedin, 2017, Angewandte Chemie.

Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks

Hayden R. Alty, R. Winpenny, A. Chaker, 2020, ACS Applied Nano Materials.

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Hayden R. Alty, A. Scherer, R. Winpenny, 2022, Advanced Functional Materials.

Use of Supramolecular Assemblies as Lithographic Resists.

Hayden R. Alty, A. Scherer, F. Schedin, 2017, Angewandte Chemie.