Laurent Azarnouche
发表
David B. Graves,
C. Grant Willson,
Christopher J. Ellison,
2016,
SPIE Advanced Lithography.
Olivier Joubert,
Marc Fouchier,
Erwine Pargon,
2013
.
193nm resist chemical modification induced by HBr cure plasma treatment: a TD-GC/MS outgassing study
Erwine Pargon,
Raluca Tiron,
Claire Sourd,
2011,
Advanced Lithography.
Olivier Joubert,
Marc Fouchier,
Erwine Pargon,
2012,
Advanced Lithography.
Olivier Joubert,
Marc Fouchier,
Erwine Pargon,
2011
.
David B. Graves,
Christopher J. Ellison,
Emir Gurer,
2016
.
Marc Fouchier,
Erwine Pargon,
K. Menguelti,
2013
.
Olivier Joubert,
Marc Fouchier,
Erwine Pargon,
2012
.
Olivier Joubert,
Marc Fouchier,
Erwine Pargon,
2013
.