Steven L. Carson

EUV progress toward HVM readiness

Ted Liang, Sam Sivakumar, Britt Turkot, 2016, SPIE Advanced Lithography.

Demonstration of full-field patterning of 32 nm test chips using EUVL

James S. Clarke, Guojing Zhang, Manish Chandhok, 2009, Advanced Lithography.

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Ted Liang, Safak Sayan, Takahiro Shirai, 2021, Advanced Lithography.