Mikio Kadoi

Study on photochemical analysis system (VLES) for EUV lithography

Takahiro Kozawa, Atsushi Sekiguchi, Yoshiyuki Kono, 2007, SPIE Advanced Lithography.

Development of analysis system for F2-excimer laser photochemical processes

Chris A. Mack, Yasuhiro Miyake, Atsushi Sekiguchi, 2000, Advanced Lithography.

Study of proximity lithography simulations using measurements of dissolution rate and calculation of the light intensity distributions in the photoresist

Yoshihisa Sensu, Atsushi Sekiguchi, Mikio Kadoi, 2004, SPIE Advanced Lithography.

Measuring system for simulation parameters of chemical amplification resist systems

Atsushi Sekiguchi, Mikio Kadoi, Toshiharu Matsuzawa, 1999 .

Radial Distribution of Oxygen Precipitates in Czochralski Silicon Single Crystals

Mikio Kadoi, Yasushi Shimanuki, H. Sasaki, 1994 .