R. Orobtchouk

Multiple pass exposure in e-beam lithography: application to the sub-22nm nodes

S. Manakli, L. Pain, A. Poncet, 2010, Advanced Lithography.

Mid-IR integrated photonics for sensing applications

L. Carletti, X. Letartre, P. Viktorovitch, 2015, SPIE OPTO.

Highly integrated optical 8x8 lambda-router in silicon-on-insulator technology: comparison between the ring and racetrack configuration

J. M. Fédéli, R. Orobtchouk, G. F. Fan, 2010, Photonics Europe.