Tsukasa Yamazaki

Image placement of large window-size membrane for EPL and LEEPL mask

Takashi Yoshii, Takashi Susa, Akira Tamura, 2005, Photomask Japan.

Realization of mass production for 130-nm node and future applicatiton for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography

Koichiro Kanayama, Tadashi Matsuo, Tsukasa Yamazaki, 2001, SPIE Photomask Technology.

ZrSiON as a material for high-transmittance attenuated PSM

Koichiro Kanayama, Tadashi Matsuo, Tsukasa Yamazaki, 2001, Photomask Japan.

Self-Organising Fuzzy Controller

Michio Sugeno, Tsukasa Yamazaki, M. Sugeno, 1984 .

Stencil pattern accuracy of EPL masks

Takashi Yoshii, Takashi Susa, Akira Tamura, 2005, Photomask Japan.

A Simple Fuzzy Predictive Controller with Model Tuning for SISO Systems

Tsukasa Yamazaki, 1994 .

Investigation of the development process for high-precision patterning

Tsukasa Yamazaki, Toru Komizo, Amy E. Zweber, 2009, Photomask Japan.