Karine Jullian

Impact of reticle absorber on the imaging properties in ArFi lithography

Jo Finders, Michael Ben Yishai, S. Mangan, 2012, European Mask and Lithography Conference.

Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45-nm to sub-28-nm logic nodes

Jo Finders, Orion Mouraille, Bart Smeets, 2012, European Mask and Lithography Conference.