Hiroyuki Nakano

发表

Frequency stabilization and frequency control of a semiconductor laser using the Faraday effect of the Rb absorption line

Takashi Sato, Takao Nakazawa, Takashi Ueno, 1993, Other Conferences.

Optimization of dual BARC structures for hyper-NA immersion lithography

Hiroichi Kawahira, Hiroyuki Nakano, Nobuyuki Matsuzawa, 2006, SPIE Advanced Lithography.

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

Tetsuya Kitagawa, Hiroichi Kawahira, Hiroyuki Nakano, 2005, SPIE Advanced Lithography.

Second- and third-harmonic generations of soluble vanadyl phthalocyanine doped in polymer films

Hideo Furuhashi, Yoshiyuki Uchida, Teruyoshi Mizutani, 1999, Other Conferences.

Morphologies and nonlinear optical characteristics of vanadylphthalocyanine thin films prepared on polycarbonate and KBr substrates

Hideo Furuhashi, Yoshiyuki Uchida, Teruyoshi Mizutani, 2004, SPIE Micro + Nano Materials, Devices, and Applications.

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Tetsuya Kitagawa, Hiroyuki Nakano, Shigeru Moriya, 2003, SPIE Advanced Lithography.

Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node

Kaoru Koike, Hiroyuki Nakano, Shigeru Moriya, 2002, Photomask Japan.

Oscillation frequency stabilization of a semiconductor laser under direct FSK by using the PEAK method

Kazuto Tamura, Takashi Sato, Masashi Ohkawa, 1998, Other Conferences.

Orientation of vanadyl-phthalocyanine film prepared by molecular beam epitaxy and treated in organic gas

Hideo Furuhashi, Yoshiyuki Uchida, Teruyoshi Mizutani, 2001, International Conference on Fiber Optics and Photonics.

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Kazuya Iwase, Hiroichi Kawahira, 2004, SPIE Advanced Lithography.

Development of Process Design Support System by High Speed 5-axis Machining Simulation

Hiroyuki Nakano, Yoshihiko Yamada, Yoshimasa Kuwano, 2013 .

SiOxNy:H, high-performance antireflective layer for current and future optical lithography

Toshiro Tsumori, Hiroyuki Nakano, Tohru Ogawa, 1994, Advanced Lithography.

Oscillation wavelength shifts of visible and infrared laser diodes in a magnetic field

Takayuki Nakagawa, Takashi Sato, Masashi Ohkawa, 1998, Other Conferences.

Analysis of critical dimension uniformity for LEEPL

Tetsuya Kitagawa, Kazuya Iwase, Hiroyuki Nakano, 2004, SPIE Advanced Lithography.

Oscillation frequency stabilization of a semiconductor laser using the magneto-optical effects of Rb-D2 absorption line

Takashi Sato, Masashi Ohkawa, Takeo Maruyama, 1998, Other Conferences.

High-speed and ultralow-chirp 11.55 mu m multiquantum well lambda /4-shifted DFB lasers

Hiroyuki Nakano, Naoki Chinone, Kazuhisa Uomi, 1991 .

Intrinsic modulation bandwidth in ultra-high-speed 1.3 and 1.55 mu m GaInAsP DFB lasers

K. Uomi, Hiroyuki Nakano, Naoki Chinone, 1989 .

Oscillation wavelength shift characters of a semiconductor laser in a magnetic field: Observation by using a beat note

Masashi Ohkawa, Takeo Maruyama, Hiroyuki Nakano, 1998 .

Zeeman effect‐based control‐signal improvement for frequency stabilization of a semiconductor laser

Masashi Ohkawa, Takeo Maruyama, Hiroyuki Nakano, 1997 .

10-Gb/s, 4-channel wavelength division multiplexing fiber transmission using semiconductor optical amplifier modules

Hiroyuki Nakano, Shinji Tsuji, S. Sasaki, 1993 .

Ultrahigh-speed 1.55 mu m lambda /4-shifted DFB PIQ-BH lasers with bandwidth of 17 GHz

K. Uomi, Hiroyuki Nakano, Naoki Chinone, 1989 .

Frequency stabilization of a semiconductor laser using the magneto‐optical effect and the saturated absorption optical system

Hiroyuki Nakano, Minoru Shimba, Takao Nakazawa, 1994 .