J. H. Chen

A 0.13 /spl mu/m CMOS technology with 193 nm lithography and Cu/low-k for high performance applications

J. Y. Cheng, Mong-Song Liang, Hun-Jan Tao, 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

Cold metal transfer welding–brazing of pure titanium TA2 to magnesium alloy AZ31B

J. H. Chen, Q. Lin, R. Cao, 2014 .

Reflow Process for Contact Hole ArF Lithography

Shang-Ho Lin, J. H. Chen, D. C. Owe-Yang, 2004 .

Hooge’s constant for carbon nanotube field effect transistors

Masa Ishigami, J. H. Chen, M. S. Fuhrer, 2006 .

High-Performance ZnS: In Film and In Doping Effect on Its Structural, Optical and Electrical Properties

J. H. Chen, Shuying Cheng, W. Li, 2013 .

Dimensional analysis of detrimental ozone generation by positive wire-to-plate corona discharge in air

J. H. Chen, Z. Bo, Junhong Chen, 2010 .