Kimiyoshi Deguchi

发表

Effect of SiC x-ray masks on alignment accuracy of heterodyne alignment

Takao Taguchi, Hajime Aoyama, Makoto Fukuda, 1997, Advanced Lithography.

Present status and technical issues of x-ray lithography

Jiro Nakamura, Tadahito Matsuda, Kimiyoshi Deguchi, 1998, Photomask and Next Generation Lithography Mask Technology.

Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography

Kimiyoshi Deguchi, Yoh Somemura, 1992 .

Application of x‐ray lithography with a single‐layer resist process to subquartermicron large scale integrated circuit fabrication

Shinsuke Konaka, Hakaru Kyuragi, Tadahito Matsuda, 1992 .

Air bearing guided high speed XY stage.

Hiroo Kinoshita, Kimiyoshi Deguchi, Munenori Kanai, 1986 .

Phantom exposures of chemically amplified resists caused by acids generated in environmental air in synchrotron radiation lithography

Masatoshi Oda, Yoshio Kawai, Makoto Fukuda, 1999 .

Extendibility of synchrotron radiation lithography to the sub‐100 nm region

Hideo Yoshihara, Akira Ozawa, Masatoshi Oda, 1996 .

Overlay evaluation of proximity x-ray lithography in 100 nm device fabrication

Takao Taguchi, Hajime Aoyama, Hirofumi Morita, 2000 .

Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography

Yoshio Kawai, Kimiyoshi Deguchi, J. Nakamura, 1999 .

X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition

Tadahito Matsuda, Kimiyoshi Deguchi, K. Deguchi, 1992 .

Synchrotron radiation lithography applied to fabrication of deep-submicrometer NMOS devices at all exposure levels

Toshiyuki Horiuchi, Eiichi Yamamoto, Akira Yoshikawa, 1990 .

Resist Surface Roughness Calculated using Theoretical Percolation Model.

Hiroshi Ban, Kimiyoshi Deguchi, H. Ban, 1998 .

Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography

Tadahito Matsuda, Tetsuyoshi Ishii, Kimiyoshi Deguchi, 1992 .