Wenli Collison

Design and performance of a step and repeat imprinting machine

Ian McMackin, S. V. Sreenivasan, Philip Schumaker, 2003, SPIE Advanced Lithography.

Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control

Chadi El Chemali, Jim Freudenberg, Matt Hankinson, 2003 .

HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy

Ronald K. Hanson, Douglas S. Baer, Shang-I Chou, 2001 .