Toshiyuki Iwamoto

Overlay and critical dimension control in proximity X-ray lithography : Special issue on advanced semiconductor processing technology

Yuusuke Tanaka, Katsumi Suzuki, Kiyoshi Fujii, 2001 .

Fabrication of NIST-format x-ray masks with 4-Gb DRAM patterns

Kenichiro Suzuki, Kiyoshi Fujii, Y. Tanaka, 2001, Photomask Japan.

High-Reliability Lithography Performed by Ultrasonic and Surfactant-Added Developing System

Tadahiro Ohmi, Masanobu Onodera, Shigeki Shimomura, 1993 .

Formation Process of Highly Reliable Ultra-Thin Gate Oxide

Tadahiro Ohmi, Toshiki Miyake, Toshiyuki Iwamoto, 1996 .