Demetre J. Economou

发表

Effect of Geometry on CVI with RF Heating

Vikas Midha, Demetre J. Economou, 2010 .

Two-phase mass transfer in channel electrolyzers with gas-liquid flow

D. J. Economou, Richard C. Alkire, Demetre J. Economou, 1985 .

A time-average model of the RF plasma sheath

D. J. Economou, Richard C. Alkire, Demetre J. Economou, 1988 .

Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O2 plasmas using trace rare gases optical emission spectroscopy

Vincent M. Donnelly, V. M. Donnelly, Merritt Funk, 2009 .

A Mathematical Model for a Parallel Plate Plasma Etching Reactor

D. J. Economou, Richard C. Alkire, Demetre J. Economou, 1988 .

Fluid simulations of radio frequency glow discharges: Two‐dimensional argon discharge including metastables

D. J. Economou, Dimitris P. Lymberopoulos, Demetre J. Economou, 1993 .

Uniformity of Etching in Parallel Plate Plasma Reactors

D. J. Economou, Demetre J. Economou, Sang‐Kyu Park, 1989 .

Molecular dynamics simulations of low-energy (25–200 eV) argon ion interactions with silicon surfaces: Sputter yields and product formation pathways

Steven J. Plimpton, D. J. Economou, Demetre J. Economou, 1998 .

Plasma molding over surface topography: Simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas

Joseph Ray Woodworth, T. W. Hamilton, R. J. Shul, 2003 .

SiO2 etching in inductively coupled C2F6 plasmas: surface chemistry and two-dimensional simulations

D. J. Economou, Demetre J. Economou, Doosik Kim, 2000 .

Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge

Vincent M. Donnelly, V. M. Donnelly, Merritt Funk, 2008 .

Kinetic simulation of capacitively coupled plasmas driven by trapezoidal asymmetric voltage pulses

D. J. Economou, Demetre J. Economou, Paola Diomede, 2014 .

Effect of Potential Field on Ion Deflection and Shape Evolution of Trenches during Plasma‐Assisted Etching

D. J. Economou, Richard C. Alkire, Demetre J. Economou, 1988 .

Modeling of Plasma Etching Reactors Including Wafer Heating Effects

D. J. Economou, Eray S. Aydil, Demetre J. Economou, 1993 .

Molecular dynamics simulation of atomic layer etching of silicon

D. J. Economou, Demetre J. Economou, S. Athavale, 1995 .

In situ monitoring of etching uniformity in plasma reactors

D. J. Economou, Eray S. Aydil, Demetre J. Economou, 1991 .

Time- and space-resolved measurements of Ar(1s5) metastable density in a microplasma using diode laser absorption spectroscopy

Vincent M. Donnelly, V. M. Donnelly, D. J. Economou, 2011 .

Silicon nitride and silicon etching by CH3F/O2 and CH3F/CO2 plasma beams

Vincent M. Donnelly, Qiaowei Lou, Demetre J. Economou, 2016 .

Modeling and simulation of glow discharge plasma reactors

D. J. Economou, Dimitris P. Lymberopoulos, Demetre J. Economou, 1994 .

Fluid simulations of glow discharges: Effect of metastable atoms in argon

D. J. Economou, Dimitris P. Lymberopoulos, Demetre J. Economou, 1993 .

Two-dimensional direct simulation Monte Carlo (DSMC) of reactive neutral and ion flow in a high density plasma reactor

Timothy J. Bartel, D. J. Economou, Demetre J. Economou, 1995 .

Direct simulation Monte Carlo (DSMC) of rarefied gas flow during etching of large diameter (300-mm) wafers

Timothy J. Bartel, D. J. Economou, Demetre J. Economou, 1996 .

A mathematical model for etching of silicon using CF4 in a radial flow plasma reactor

Demetre J. Economou, Sang‐Kyu Park, 1991 .

The anomalous skin effect in gas discharge plasmas

D. J. Economou, Vladimir Kolobov, Demetre J. Economou, 1997 .