Shenliang Sun

发表

Approaches to etch-resistant 193-nm photoresists: performance and prospects

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Richard A. Di Pietro, Donald C. Hofer, Martin McCallum, 1999, Advanced Lithography.