J. K. Wu

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

Maciej W. Rudzinski, Kong Son, Lantian Wang, 2004, SPIE Advanced Lithography.

In die mask overlay control for 14nm double-patterning lithography

Young Ham, Jeff McMurran, William Chou, 2015, SPIE Photomask Technology.

Dextrous Workspaces of Manipulators. I. Analytical Criteria

Edward J. Haug, J. Y. Wang, J. K. Wu, 1992 .

An a-Si:H/SiGe/Si punchthrough heterojunction phototransistors with an thin-Al film

J. K. Wu, J. Hwang, 2009 .