Yosuke Shirata

Double patterning lithography study with high overlay accuracy

Takahisa Kikuchi, Yuuki Ishii, Yosuke Shirata, 2010, Advanced Lithography.

Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node

Takayuki Funatsu, Yuichi Shibazaki, Akira Hayakawa, 2015, Advanced Lithography.

Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning

Yuuki Ishii, Hisashi Nishinaga, Shinji Wakamoto, 2010, Advanced Lithography.

High-productivity immersion scanner enabling 1xnm hp manufacturing

Takahisa Kikuchi, Yasuhiro Ohmura, Yuichi Shibazaki, 2013, Advanced Lithography.

Stability and calibration of overlay and focus control for a double patterning immersion scanner

Takahisa Kikuchi, Yuuki Ishii, Shinji Wakamoto, 2011, Advanced Lithography.

Immersion scanners enabling 10nm half-pitch production and beyond

Takayuki Funatsu, Yuichi Shibazaki, Yosuke Shirata, 2014, Advanced Lithography.

An immersion scanner enabling 10 nm half pitch production and high productivity

Tomoyuki Matsuyama, Yosuke Shirata, Tsuyoshi Suzuki, 2015, 2015 China Semiconductor Technology International Conference.