Christopher N. Anderson

发表

The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2009, Advanced Lithography.

Low-speckle holographic beam shaping of high-coherence EUV sources

Patrick P. Naulleau, Christopher N. Anderson, Ryan Miyakawa, 2011, Advanced Lithography.

MOSAIC: a new wavefront metrology

Patrick P. Naulleau, Christopher N. Anderson, 2009, Advanced Lithography.

Directly patterned inorganic hardmask for EUV lithography

Patrick P. Naulleau, Douglas A. Keszler, Christopher N. Anderson, 2011, Advanced Lithography.

Using synchrotron light to accelerate EUV resist and mask materials learning

Kenneth A. Goldberg, Warren Montgomery, Iacopo Mochi, 2011, European Mask and Lithography Conference.

A high-throughput contact-hole resolution metric for photoresists: full-process sensitivity study

Patrick P. Naulleau, Christopher N. Anderson, 2008, SPIE Advanced Lithography.

Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2008, SPIE Advanced Lithography.

Spin-on-glass smoothing of diamond turned optics for use in the extreme ultraviolet regime

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, 2008, SPIE MOEMS-MEMS.

Transformer VAE: A Hierarchical Model for Structure-Aware and Interpretable Music Representation Learning

Christopher N. Anderson, Ryan Miyakawa, Junyan Jiang, 2020, ICASSP 2020 - 2020 IEEE International Conference on Acoustics, Speech and Signal Processing (ICASSP).

EUV Research at Berkeley Lab: Enabling Technologies and Applications

Kenneth A. Goldberg, Patrick P. Naulleau, Peter Fischer, 2016 .

Sensitivity study of reliable, high-throughput resolution metricsfor photoresists

Patrick P. Naulleau, Christopher N. Anderson, 2008 .

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, Photomask Japan.

Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time

Patrick P. Naulleau, Christopher N. Anderson, Joe Daggett, 2010, Advanced Lithography.

The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch

Kenneth A. Goldberg, Warren Montgomery, Simi George, 2010, Advanced Lithography.

Critical challenges for EUV resist materials

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2011, Advanced Lithography.

The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2011, Advanced Lithography.

High-NA metrology and sensing on Berkeley MET5

Christopher N. Anderson, Ryan Miyakawa, Patrick P. Naulleau, 2017, Advanced Lithography.

Film quantum yields of EUV and ultra-high PAG photoresists

Emil C. Piscani, Jeff Byers, Matthew Malloy, 2008, SPIE Advanced Lithography.

Extreme ultraviolet interference lithography with incoherent light

Patrick P. Naulleau, Christopher N. Anderson, Stephen F. Horne, 2007, SPIE Advanced Lithography.

Corner Rounding in Photoresists for Extreme Ultraviolet Lithography

Yunfei Deng, Patrick Naulleau, Christopher N. Anderson, 2008 .

Photoresist shrinkage effects at EUV

Thomas V. Pistor, Patrick P. Naulleau, Thomas I. Wallow, 2011, Advanced Lithography.

Lithographic metrics for the determination of intrinsic resolution limits in EUV resists

Patrick P. Naulleau, Bruno La Fontaine, Christopher N. Anderson, 2007, SPIE Advanced Lithography.

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2009 .

Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool

Patrick P. Naulleau, Christopher N. Anderson, Paul Denham, 2007 .

Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists

Patrick P. Naulleau, Christopher N. Anderson, P. Naulleau, 2009 .

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2007 .

The SEMATECH Berkeley MET : extending EUV learning to 16-nm half pitch

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2011 .

Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise

Patrick P. Naulleau, Gregg M. Gallatin, Robert L. Brainard, 2008 .

Stochastics and EUV Patterning in the 1x-nm Regime

Patrick P. Naulleau, Andrew R. Neureuther, Christopher N. Anderson, 2016 .

Deprotection blur in extreme ultraviolet photoresists: Influence of base loading and post-exposure bake temperature

Patrick P. Naulleau, Christopher N. Anderson, 2009 .

EUV Resists: Pushing to the Extreme

Patrick P. Naulleau, Mark Neisser, Andrew R. Neureuther, 2014 .

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2015 .

Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2008 .

Studying Resist Stochastics with the Multivariate Poisson Propagation Model

Patrick P. Naulleau, Andrew R. Neureuther, Christopher N. Anderson, 2014 .

Multiplexed high resolution soft x-ray RIXS

Kenneth A. Goldberg, Markus P. Benk, Christopher N. Anderson, 2016 .

Enabling EUV Ressist Research at the 1 and Smaller Regime

Kenneth A. Goldberg, Patrick P. Naulleau, Mark Neisser, 2015 .