K. Ota

70 nm SOI-CMOS of 135 GHz f/sub max/ with dual offset-implanted source-drain extension structure for RF/analog and logic applications

T. Iwamatsu, S. Maegawa, S. Maeda, 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

On the Flanged Plote System in Ship Construction

K. Ota, 1914 .

Overview of the stability and barrier functions of the granitic geosphere at the Kamaishi Mine: rele

K. Ota, Kenji Amano, T. Semba, 2000 .