C. S. Knurek

Pattern placement correction methodology for 200 mm SCALPEL masks

Michael J. Lercel, William J. Dauksher, Myrtle I. Blakey, 2001 .

Dry etch patterning of chrome on glass optical masks using P(SI-CMS) resist

Christophe Pierrat, David A. Mixon, Anthony E. Novembre, 1994, Photomask Technology.

Metrology of scattering with angular limitation projection electron lithography masks

C. S. Knurek, D. Tennant, D. Windt, 1997 .

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

David L. Windt, Myrtle I. Blakey, Warren K. Waskiewicz, 1995 .

Preliminary results from a prototype projection electron‐beam stepper‐scattering with angular limitation projection electron beam lithography proof‐of‐concept system

David L. Windt, Myrtle I. Blakey, Lloyd R. Harriott, 1996 .