D. J. Resnick

发表

Pattern placement correction methodology for 200 mm SCALPEL masks

Michael J. Lercel, William J. Dauksher, Myrtle I. Blakey, 2001 .

Processing Methods for the Fabrication of Sub-0.25 µm GaAs Heterostructure Devices and Circuits

R. F. Kopf, Fan Ren, D. J. Resnick, 1989, Advanced Lithography.

Imprint lithography for integrated circuit fabrication

William J. Dauksher, Kevin J. Nordquist, Todd C. Bailey, 2003 .

Direct die-to-database electron-beam inspection of fused silica imprint templates

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2006, SPIE Photomask Technology.

Efficient and robust algorithms for Monte Carlo and e-beam lithography simulation

D. J. Resnick, V. V. Ivin, M. V. Silakov, 2001 .

Writing, repairing, and inspecting of extreme ultraviolet lithography reticles considering the impact of the materials

Kevin J. Nordquist, James R. Wasson, Pawitter J. S. Mangat, 2001 .

Repair of step and flash imprint lithography templates

William J. Dauksher, Kevin J. Nordquist, K. Gehoski, 2004 .

Study of electron beam patterning of resist on tungsten x-ray masks

J. Frackoviak, K. D. Cummings, L. E. Trimble, 1993 .

Stress reduction of gold absorber patterns on x-ray masks

William J. Dauksher, Raul E. Acosta, W. A. Johnson, 1992 .

Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks

Kevin J. Nordquist, James R. Wasson, Pawitter J. S. Mangat, 2002 .

Comparison of negative resists for 100 nm electron-beam direct write and mask making applications

Kevin J. Nordquist, Eric S. Ainley, D. J. Resnick, 1998 .

Modeling of in-plane distortions due to variations in absorber stress

Roxann L. Engelstad, Karen A. Thole, William J. Dauksher, 1996 .

Fabrication of multi-tiered structures on step and flash imprint lithography templates

S. V. Sreenivasan, William J. Dauksher, Kevin J. Nordquist, 2003 .

Cr absorber etch process for extreme ultraviolet lithography mask fabrication

William J. Dauksher, James R. Wasson, Pawitter J. S. Mangat, 2001 .

Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, K. Gehoski, 2004 .

Kosterlitz-Thouless Transition in Proximity-Coupled Superconducting Arrays

J. C. Garland, D. J. Resnick, D. Resnick, 1981 .

Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates

S. V. Sreenivasan, William J. Dauksher, Kevin J. Nordquist, 2002 .

Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication

William J. Dauksher, Pawitter J. S. Mangat, Shahid Rauf, 2001 .

Effects of etch barrier densification on step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, K. Gehoski, 2005 .

Radiation damage effects in boron nitride mask membranes subjected to x‐ray exposures

Roland A. Levy, Arnold W. Yanof, W. A. Johnson, 1987 .

Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber

Jonathan L. Cobb, Scott Daniel Hector, William J. Dauksher, 1999 .

Template fabrication schemes for step and flash imprint lithography

A. Alec Talin, William J. Dauksher, Kevin J. Nordquist, 2002 .

Inter- and intramembrane resist critical dimension uniformity across a SCALPEL mask

Roxann L. Engelstad, Kevin J. Nordquist, Eric S. Ainley, 2000 .

Optimization of an electron cyclotron resonance etch process using full wafer charge coupled device interferometry

William J. Dauksher, K. D. Cummings, D. J. Resnick, 1997 .

Prediction of fabrication distortions in step and flash imprint lithography templates

Roxann L. Engelstad, Edward G. Lovell, D. J. Resnick, 2002 .

Direct die-to-database electron beam inspection of fused silica imprint templates

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2006 .

Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications

R. C. Tiberio, Kevin J. Nordquist, Eric S. Ainley, 1999 .

Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

S. V. Sreenivasan, Kevin J. Nordquist, Eric S. Ainley, 2002 .

Extreme ultraviolet mask fabrication with high inspection contrast TaSiNx absorber stack

Roxann L. Engelstad, William J. Dauksher, James R. Wasson, 2003 .

Prediction of in-plane distortions due to mask fabrication processes

Roxann L. Engelstad, William J. Dauksher, M. Laudon, 1997 .

Using reverse-tone bilayer etch in ultraviolet nanoimprint lithography

S. V. Sreenivasan, Nick Stacey, David Tar-Wei Wang, 2005, MICRO 2005.

Improved step and flash imprint lithography templates for nanofabrication

S. V. Sreenivasan, William J. Dauksher, Kevin J. Nordquist, 2003 .

Temperature uniformity across an x‐ray mask membrane during resist baking

Roxann L. Engelstad, K. D. Cummings, W. A. Johnson, 1994 .