Christophe Soonekindt

Detection sensitivity improvement on STI module in 28nm process foundry logic node

Dan Koronel, Govinda Soni, Vijeet Gupta, 2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).

Complementary dose and geometrical solutions for electron beam direct write lithography proximity effects correction: application for sub-45-nm node product manufacturing

L. Pain, Christophe Soonekindt, B. Icard, 2007 .