Simon J. Fang

A study of within-wafer non-uniformity metrics

Duane S. Boning, Taber H. Smith, Simon J. Fang, 1999, 1999 4th International Workshop on Statistical Metrology (Cat. No.99TH8391).

A CMP MODEL COMBINING DENSITY AND TIME DEPENDENCIES

Duane S. Boning, Taber H. Smith, Simon J. Fang, 1999 .

Analysis of interface roughness’s effect on metal–oxide–semiconductor Fowler-Nordheim tunneling behavior using atomic force microscope images

Simon J. Fang, C. R. Helms, T. Yamanaka, 1997 .

Optimization of the Chemical Mechanical Polishing Process for Premetal Dielectrics

Honglin Guo, Taber H. Smith, Simon J. Fang, 2000 .

Proven Practice and Future Application of Polysilicon CMP in IC Fabrication**

Simon J. Fang, Fritz Redeker, Raymond R. Jin, 2000 .