Atsuro Eitoku

Roadblocks andCritical Aspects ofCleaning forSub-65nm Technologies

Harald Kraus, Kenichi Sano, Kurt Wostyn, 2006 .

Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool

Kazuo Nakajima, Marc Heyns, Rita Vos, 2003 .