Chuen Huei Yang

A systematic approach for capturing interconnects hot spots

P. R. Tsai, Mohamed Al-Imam, H. Y. Liao, 2007, SPIE Advanced Lithography.

Implementing a framework to generate a unified OPC database from different EDA vendors for 45nm and beyond

Jochen Schacht, Te Hung Wu, Chia Wei Huang, 2009, Advanced Lithography.

SEM based data extraction for model calibration

Sheng Yuan Huang, Mohamed Al-Imam, H. Y. Liao, 2007, SPIE Advanced Lithography.

Implementing a framework to generate a unified OPC from different EDA vendors for 45nm node and beyond

Jochen Schacht, Te Hung Wu, Chia Wei Huang, 2008 .