Jeffrey A. Leavey

X ray fills the gap

Alek C. Chen, Alan C. Thomas, Paul D. Agnello, 1998, Advanced Lithography.

Mask and wafer inspection and cleaning for proximity x-ray lithography

Pawitter J. S. Mangat, Jeffrey A. Leavey, 1998, Advanced Lithography.

Lithography process control and optimization based on defect capture and reduction

Andrew Skumanich, Jeffrey A. Leavey, John Boyle, 2000, Advanced Lithography.

Simulation of x-ray mask defect printability

Franco Cerrina, Scott Daniel Hector, Jeffrey A. Leavey, 1997, Advanced Lithography.

Pellicles for x-ray lithography masks

Marie Angelopoulos, Jeffrey A. Leavey, Raul E. Acosta, 1998, Advanced Lithography.

Design considerations for the IBM X-ray lithography facility

Jeffrey A. Leavey, L. Grant Lesoine, 1993, IBM J. Res. Dev..

Advanced process control based on lithographic defect inspection and reduction

Andrew Skumanich, Jeffrey A. Leavey, John Boyle, 2000, 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072).

ALF: a facility for x-ray lithography

Jeffrey A. Leavey, L. Grant Lesoine, Kenneth W. Kukkonen, 1990, Advanced Lithography.

ALF: a facility for x-ray lithography II--a progress report

Jeffrey A. Leavey, Kenneth W. Kukkonen, L. G. Lesoine, 1992, Advanced Lithography.

X‐ray induced mask contamination and particulate monitoring in x‐ray steppers

Scott Daniel Hector, Jeffrey A. Leavey, Victor Pol, 1996 .

Installation and early operating experience with the Helios compact synchrotron x‐ray source

R. W. Hill, Chet Wasik, Jeffrey A. Leavey, 1992 .