Ryoung-Han Kim

2D self-aligned via patterning strategy with EUV single-exposure in 3nm technology

Suhyeong Choi, Jae Uk Lee, Victor M. Blanco Carballo, 2017, Advanced Lithography.

The effect of patterning options on embedded memory cells in logic technologies at iN10 and iN7

Wim Dehaene, Praveen Raghavan, Pieter Weckx, 2017, Advanced Lithography.

EUV insertion strategy into logic technology on the horizon of scaling paradigm change

Ryoung-Han Kim, 2019 .

Large marginal 2D self-aligned via patterning for sub-5nm technology

Peter Debacker, Praveen Raghavan, Suhyeong Choi, 2017, Advanced Lithography.