A. Koike

A new fab concept in the 300 mm wafer era

A. Koike, 2000, Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130).

Application of scanning near-field optical microscopy to thin organic film devices

Hirosato Monobe, Norio Chiba, Hiroshi Muramatsu, 1998 .