W. Bai

Theoretical and experimental investigation of Si nanocrystal memory device with HfO/sub 2/ high-k tunneling dielectric

Dim-Lee Kwong, J. J. Lee, X. Wang, 2003, VLSIT 2003.

Theoretical and experimental investigation of Si nanocrystal memory device with HfO/sub 2/ high-k tunneling dielectric

J.J. Lee, J. Liu, X. Wang, 2003, 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407).

Epitaxial strained germanium p-MOSFETs with HfO/sub 2/ gate dielectric and TaN gate electrode

W. Bai, D. Kwong, D. Antoniadis, 2003, IEEE International Electron Devices Meeting 2003.