D. J. Resnick

Development of an etch-definable lift-off process for use with step and flash imprint lithography

William J. Dauksher, Ngoc V. Le, Kathleen A. Gehoski, 2005, SPIE Advanced Lithography.

Using reverse-tone bilayer etch in ultraviolet nanoimprint lithography

S. V. Sreenivasan, Nick Stacey, David Tar-Wei Wang, 2005, MICRO 2005.