Marc Kea

Massive metrology and failure identification for DRAM applications (Conference Presentation)

Chang-Moon Lim, Jin-Woo Lee, Harm Dillen, 2019 .

Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes

Leon Verstappen, Bijoy Rajasekharan, Jan Mulkens, 2016, SPIE Advanced Lithography.

Reducing overlay sampling for APC-based correction per exposure by replacing measured data with computational prediction

Marc Kea, Babak Mokaberi, Hyun Sik Kim, 2016, SPIE Advanced Lithography.

Massive CD metrology for EUV failure characterization and EPE metrology

Peng Tang, Gijsbert Rispens, Harm Dillen, 2018, Photomask Technology.

Applications of on-product diffraction-based focus metrology in logic high volume manufacturing

Chen Li, Marc Kea, Kevin Park, 2016, SPIE Advanced Lithography.

Understanding advanced DRAM edge placement error budget and opportunities for control

Chan Hwang, Seung Yoon Lee, Jeongjin Lee, 2020, Advanced Lithography.

Assessment of stochastic fail rate using E-beam massive metrology

Richer Yang, Kunyuan Chen, Wallace He, 2021, Advanced Lithography.