Obert Wood

发表

Application of phase shift focus monitor in EUVL process control

Sudhar Raghunathan, Iacopo Mochi, Vibhu Jindal, 2013, Advanced Lithography.

Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements

Kenneth A. Goldberg, Tsuneo Terasawa, Patrick A. Kearney, 2006 .

Extreme Ultraviolet Lithography Development in the United States

Obert Wood, 2006 .

Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion

Roxann L. Engelstad, Edward G. Lovell, Phillip L. Reu, 2002 .

Benchmarking stencil reticles for electron projection lithography

Michael J. Lercel, Carey W. Thiel, Obert Wood, 2003 .

Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

Vicky Philipsen, Eric Hendrickx, Marc Heyns, 2016 .

Ni-TaN Nanocomposite Absorber For Next-Generation Extreme Ultraviolet Lithography

Ryoung-Han Kim, Zhimin Shi, Zhengqing John Qi, 2016 .

EUV Lithography: An Historical Perspective

Hiroo Kinoshita, Obert Wood, 2008 .

EUVL: Challenges to Manufacturing Insertion

Obert Wood, O. Wood, 2017 .

Modeling EUV mask using alternative materials for mask 3D effect compensation

Vicky Philipsen, Eric Hendrickx, Marc Heyns, 2015 .

Fourier spectrum method to determine dose-to-clear in a photoresist.

Sudhar Raghunathan, Pawitter Mangat, Oleg Kritsun, 2014, Optics letters.