Peter Buck

发表

Mask model calibration for MPC applications utilizing shot dose assignment

Ingo Bork, Peter Buck, Sankaranarayanan Paninjath, 2014, Photomask Technology.

Mask data volume: historical perspective and future requirements

Richard Gladhill, Peter Buck, Chris Spence, 2006, European Mask and Lithography Conference.

Impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013 .

Einführung Einmühlenbetrieb in den Kraftwerken Bexbach und Heilbronn Block 7

Georg-Nikolaus Stamatelopoulos, Peter Buck, Timm Heinzel, 2012 .

MPC strategies for multi-beam mask writers

Ingo Bork, Peter Buck, 2019, European Mask and Lithography Conference.

The Quantitative Identification of E-6 Chemical Processing Errors

Peter Buck, Donald Betz, 1977 .

The role of model-based MPC in advanced mask manufacturing

Ingo Bork, Peter Buck, 2017, European Mask and Lithography Conference.

A mask manufacturer's perspective on maskless lithography

Peter Buck, Franklin D. Kalk, Charles Biechler, 2005, SPIE Photomask Technology.

CLMPC: curvilinear MPC in a mask data preparation flow

Nageswara Rao, Ingo Bork, Peter Buck, 2017, Photomask Technology.

The impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Advanced Lithography.

Resist-slope aware modeling for mask process correction applications

Ingo Bork, Peter Buck, Linna Cong, 2019, Photomask Technology.

The impact of 14nm photomask variability and uncertainty on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2013, Photomask Technology.

Resolution performance of a 0.60-NA, 364-nm laser direct writer

Peter Buck, Paul C. Allen, 1990, Advanced Lithography.

Extending analog design scaling to sub-wavelength lithography: co-optimization of RET and photomasks

Vishal Garg, Peter Buck, Craig West, 2011, Advanced Lithography.

A fully model-based MPC solution including VSB shot dose assignment and shape correction

Ingo Bork, Peter Buck, Murali Reddy, 2015, SPIE Photomask Technology.

Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)

Jianliang Li, Ingo Bork, Peter Buck, 2019, Photomask Technology.

Automatic classification of patterned mask defects for requalification at wafer fabs in absence of layout data

Peter Buck, Sankaranarayanan Paninjath, Chin Kuei Chang, 2020, Photomask Technology.

Method and apparatus for identifying different, elongated metallic objects, in particular items of cutlery

Peter Buck, Rainer Anthonj, Helmut Jordan, 1995 .

Extending mask data preparation to scale to thousands of CPUs and beyond

Nageswara Rao, Archana Rajagopalan, Peter Buck, 2018, Photomask Technology.

Photomasks and the enablement of circuit design complexity

Peter Buck, Craig West, Franklin Kalk, 2010, 2010 11th International Symposium on Quality Electronic Design (ISQED).

Using rule-based shot dose assignment in model-based MPC applications

Lin Wang, Ingo Bork, Peter Buck, 2014, Photomask Technology.

Advanced jog handling techniques in MPC for better QoR

Archana Rajagopalan, Ingo Bork, Peter Buck, 2018, Photomask Technology.

Comparing curvilinear vs Manhattan ILT shape efficacy on EPE and process window

James Word, Dan Zhang, Alexander Tritchkov, 2016, Photomask Technology.

Development of a geographic information-driven real-time surveillance system for disease surveillance.

Peter Buck, Jiangping Shuai, Caroline Chevalier, 2007, Veterinaria italiana.

Enhancing EUV mask blanks usability through smart shift and blank-design pairing optimization

Peter Buck, Sankaranarayanan Paninjath, Mark Pereira, 2016, European Mask and Lithography Conference.

Mask manufacturing rules checking (MRC) as a DFM strategy

Richard Gladhill, Peter Buck, Joseph Straub, 2007, SPIE Advanced Lithography.

What is cyberspace?

Peter Buck, David Birch, 1992, Comput. Law Secur. Rev..

On the Methodology of ‘Phenomenography’ As A Science Education Research Tool

Ference Marton, Cedric Linder, Martin Goedhart, 2003 .

Machine learning guided curvilinear MPC

Ingo Bork, Peter Buck, Bhardwaj Durvasula, 2019, Photomask Technology.

Software-based data path for raster-scanned multi-beam mask lithography

Archana Rajagopalan, Peter Buck, H. Christopher Hamaker, 2016, Photomask Technology.

ILT based defect simulation of inspection images accurately predicts mask defect printability on wafer

Peter Buck, Sankaranarayanan Paninjath, Mark Pereira, 2016, Photomask Japan.

Automatic classification and accurate size measurement of blank mask defects

Peter Buck, Sankaranarayanan Paninjath, Mark Pereira, 2015, Other Conferences.

Mask design automation: an integrated approach

Richard Gladhill, Peter Buck, Al Wong, 2012, Photomask Technology.

Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications

Paul Allen, Brid Connolly, Peter Buck, 2012, Other Conferences.

14-nm photomask simulation sensitivity

John L. Sturtevant, Edita Tejnil, Kent H. Nakagawa, 2014, European Mask and Lithography Conference.

Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2016 .

Mask process correction validation for multi-beam mask lithography

Elmar Platzgummer, Ingo Bork, Peter Buck, 2018, Photomask Technology.

Mask process correction method comparison and study: CD-SEM box versus standard correction method

Ingo Bork, Peter Buck, Kushlendra Mishra, 2017, Photomask Technology.

Automatic classification of blank substrate defects

Dan Rost, Peter Buck, Sankaranarayanan Paninjath, 2014, Photomask Technology.