Christof Tilmann Bodendorf

A method for producing a layout for a mask for use in the Ha lbleiterherstellung

Christof Tilmann Bodendorf, Joerg Thiele, 2001 .

Benchmark of numerical versus analytical proximity curve calculations

Christof Tilmann Bodendorf, Wolfgang Hoppe, Roderick Köhle, 2006, SPIE Advanced Lithography.

Impact of measured pupil illumination fill distribution on lithography simulation and OPC models

Ralf Ziebold, Christof Tilmann Bodendorf, Ralph E. Schlief, 2004, SPIE Advanced Lithography.

A method for optimizing a layout for a mask for use in semiconductor manufacturing

Christof Tilmann Bodendorf, Jörg Thiele, 2001 .