A. L. Bogdanov

发表

Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development

Kamil A. Valiev, A. L. Bogdanov, V. A. Nikitaev, 1990, Advanced Lithography.

AN APPLICATION OF NEURAL NETWORKS TO SOLUTION OF THE CREDIT SCORING TASK

A. L. Bogdanov, I. S. Dulya, 2018 .

Deep x-ray lithography with the SU-8 resist

Laurence Singleton, Andreas Schmidt, A. L. Bogdanov, 2001, SPIE Advanced Lithography.

D pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media

A. L. Bogdanov, Piotr Jedrasik, Tommy Holmqvist, 2003 .

Computer Simulation Of The Percolational Development And Pattern Formation In Pulsed Laser Exposed Positive Photoresists

A. L. Bogdanov, Leonid V. Velikov, D. Y. Zaroslov, 1987, Advanced Lithography.

Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production

A. L. Bogdanov, Bengt Nilsson, Piotr Jedrasik, 2003 .

The percolation approach to the development of pulsed laser exposed positive photoresists

A. L. Bogdanov, Leonid V. Velikov, Kamil'A. Valiev, 1987 .

Concept, construction and commissioning of an alignment system for deep X-ray lithography

A. L. Bogdanov, Serguei Peredkov, Oliver Wilhelmi, 2002 .

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

A. L. Bogdanov, Serguei Peredkov, A. Bogdanov, 2000 .

Fabrication of arrays of nanometer size test structures for scanning probe microscope tips characterization

A. L. Bogdanov, Håkan Olin, Bengt Nilsson, 1994 .