V. E. Tukish

Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development

Kamil A. Valiev, A. L. Bogdanov, V. A. Nikitaev, 1990, Advanced Lithography.

BRIEF COMMUNICATIONS: Precision measurement of the stimulated emission wavelength and continuous tuning of YAIO3:Nd3+ laser radiation due to 4F3/2--> 4I13/2 transition

V. E. Tukish, A. Kaminskii, S. Sarkisov, 1976 .