Robert Soper

65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Changan Wang, Mark Mason, Robert A. Soper, 2005, SPIE Advanced Lithography.

Control of Photolithography Alignment

Robert Soper, Nital Patel, 2000 .

Design rule considerations for 65-nm node contact using off axis illumination

Mark Mason, Sean O'Brien, Scott Jessen, 2005, SPIE Advanced Lithography.