Aomar Halimaoui

Metallic Source/Drain Architecture for Advanced MOS Technology: an overview of METAMOS results

Jean-Pierre Raskin, Elena Pascual, Emmanuel Dubois, 2009 .

Ultra-Thin (4nm) Gate-All-Around CMOS devices with High-k/Metal for Low Power Multimedia Applications

Nicolas Loubet, Stephane Monfray, G. Bidal, 2010 .

Non-melt laser annealing of Plasma Implanted Boron for ultra shallow junctions in Silicon

Costas P. Grigoropoulos, A. Florakis, N. Misra, 2008 .

A New Method to Induce Tensile Stress in Silicon on Insulator Substrate: From Material Analysis to Device Demonstration

Pierre Morin, Sylvain Maitrejean, Nicolas Loubet, 2015 .