R. Koret

First Monolithic Integration of 3D Complementary FET (CFET) on 300mm Wafers

J. Ryckaert, T. Chiarella, N. Horiguchi, 2020, 2020 IEEE Symposium on VLSI Technology.

OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation

J. Frougier, R. Koret, D. Schmidt, 2021, Advanced Lithography.

Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

T. Nuytten, D. Van Den Heuvel, Y. Oniki, 2021, Advanced Lithography.