S. Wege

Diagnostics of molecular plasmas and trace gas analysis using mid infrared lasers

J. Röpcke, P. B. Davies, S. Glitsch, 2009, OPTO.

Extending the capabilities of DRAM high aspect ratio trench etching

S. Wege, T. Lill, A. Henke, 2004, 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530).

Advanced STI patterning for 70 nm DRAM technology and beyond

S. Wege, M. Vogt, Chun-Cheng Liao, 2004, 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530).