Roderick R. Kunz

发表

Experimental VUV absorbance study of fluorine-functionalized polystyrenes

Roderick R. Kunz, Roger F. Sinta, Michael Sworin, 2001, SPIE Advanced Lithography.

Marathon damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Andrew Grenville, 1997, Photomask Technology.

Silylation processes for 193-nm excimer laser lithography

D. C. Shaver, Mark A. Hartney, Roderick R. Kunz, 1990, Advanced Lithography.

Outlook for 157-nm resist design

Roderick R. Kunz, Jane E. Curtin, Theodore M. Bloomstein, 1999, Advanced Lithography.

New materials for 157-nm photoresists: characterization and properties

Roderick R. Kunz, Roger H. French, Fredrick C. Zumsteg, 2000, Advanced Lithography.

Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

Roderick R. Kunz, Willard E. Conley, Robert J. LeSuer, 2004, SPIE Advanced Lithography.

157 nm: Deepest deep-ultraviolet yet

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 1999 .

Biomimetic Sniffing Improves the Detection Performance of a 3D Printed Nose of a Dog and a Commercial Trace Vapor Detector

Roderick R. Kunz, Matthew E. Staymates, William A. MacCrehan, 2016, Scientific Reports.

A high-frame-rate DUV-optimized CCD for simultaneous measurements of illumination intensity, polarization amplitude, and polarization direction for very high NA imaging systems

Roderick R. Kunz, Michael Yeung, Steven J. Spector, 2004, SPIE Advanced Lithography.

Scattering in liquid immersion lithography

Roderick R. Kunz, Theodore M. Bloomstein, Michael S. Yeung, 2004, SPIE Advanced Lithography.

Performance of excimer lasers as light sources for 193-nm lithography

Roderick R. Kunz, Scott P. Doran, Mordechai Rothschild, 1997, Advanced Lithography.

Chemical concentrator for rapid vapor detection

Roderick R. Kunz, Michael W. Geis, 1999, Defense, Security, and Sensing.

Line-edge roughness in sub-0.18-μm resist patterns

Roderick R. Kunz, Jane E. Curtin, Scott P. Doran, 1998, Advanced Lithography.

193-nm lithography (Review Paper)

Roderick R. Kunz, Mordechai Rothschild, Jan H. C. Sedlacek, 1996, Photonics West.

Monolithic detector array comprised of >1000 aerial image sensing elements

Roderick R. Kunz, Steven J. Spector, Michael S. Yeung, 2003, SPIE Advanced Lithography.

Assessment of Nanotechnology for Chemical Biological Defense

Roderick R. Kunz, Mordechai Rothschild, Michael Switkes, 2009 .

Photoresist outgassing at 157 nm exposure

Roderick R. Kunz, Theodore M. Bloomstein, Daniel Miller, 2001, SPIE Advanced Lithography.

Polysilyne resists for 193 nm excimer laser lithography

D. C. Shaver, Roderick R. Kunz, Mark W. Horn, 1991, Other Conferences.

Acid-catalyzed single-layer resists for ArF lithography

Roderick R. Kunz, Gregory M. Wallraff, William D. Hinsberg, 1993, Advanced Lithography.

Lithography at a wavelength of 193 nm

Roderick R. Kunz, Mordechai Rothschild, Susan C. Palmateer, 1997, IBM J. Res. Dev..

193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

Richard A. Di Pietro, Donald C. Hofer, Roderick R. Kunz, 1995, Advanced Lithography.

Optimization of a 193-nm silylation process for sub-0.25-um lithography

Roderick R. Kunz, Mordechai Rothschild, S. C. Palmateer, 1995, Advanced Lithography.

Bilayer resist approach for 193-nm lithography

Roderick R. Kunz, Andrew J. Blakeney, Pasquale Alfred Falcigno, 1996, Advanced Lithography.

All-dry resist processes for 193-nm lithography

Roderick R. Kunz, S. C. Palmateer, Michael S. Hibbs, 1995, Advanced Lithography.

Prospects for using existing resists for evaluating 157-nm imaging systems

Roderick R. Kunz, Theodore H. Fedynyshyn, Jane E. Curtin, 2000, Advanced Lithography.

Damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Chris K. Van Peski, 1998, Advanced Lithography.

Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz, Vladimir Liberman, D. K. Downs, 2000, Advanced Lithography.

157-nm pellicles: polymer design for transparency and lifetime

Roderick R. Kunz, Vladimir Liberman, Roger H. French, 2002, SPIE Advanced Lithography.

Thin-film imaging: Past, present, prognosis

Roderick R. Kunz, Cesar M. Garza, David E. Seeger, 1997, IBM J. Res. Dev..

Limits to etch resistance for 193-nm single-layer resists

Richard A. Di Pietro, Donald C. Hofer, Roderick R. Kunz, 1996, Advanced Lithography.

193-nm full-field step-and-scan prototype at MIT Lincoln Laboratory

Roderick R. Kunz, Michael S. Hibbs, 1995, Advanced Lithography.

Review of technology for 157-nm lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2001, IBM J. Res. Dev..

Performance of a low power fully-depleted deep submicron SOI technology and its extension to 0.15 /spl mu/m

D. C. Shaver, Roderick R. Kunz, S. C. Palmateer, 1996, 1996 IEEE International SOI Conference Proceedings.

High-sensitivity detection of trace gases using dynamic photoacoustic spectroscopy

Roderick R. Kunz, Stephen T. Palmacci, Charles M. Wynn, 2013 .

Experiment and simulation of sub-0.25-μm resist processes for 193-nm lithography

Mark A. Hartney, Roderick R. Kunz, Eytan Barouch, 1993, Advanced Lithography.

High-resolution fluorocarbon-based resist for 157-nm lithography

Roderick R. Kunz, Roger F. Sinta, Michael Sworin, 2002, SPIE Advanced Lithography.

Experimental demonstration of remote optical detection of trace explosives

Roderick R. Kunz, Mordechai Rothschild, John J. Zayhowski, 2008, SPIE Defense + Commercial Sensing.

Chemical sensing via a low SWaP wearable spectrometer

Roderick R. Kunz, Richard P. Kingsborough, Alexandra T. Wrobel, 2020, Defense + Commercial Sensing.

Key challenges and prospects for optical standoff trace detection of explosives

Roderick R. Kunz, Patrick Y. Wen, Mitesh Amin, 2017 .

Photoresist outgassing: a potential Achilles heel for short-wavelength optical lithography?

Roderick R. Kunz, 2004, SPIE Advanced Lithography.

Photoresists for 193-nm lithography

Donald C. Hofer, Roderick R. Kunz, Gregory M. Wallraff, 1997, IBM J. Res. Dev..

Resist outgassing as a function of differing photoadditives

Roderick R. Kunz, Elsa Reichmanis, Allen H. Gabor, 1999, Advanced Lithography.

Surface-imaged silicon polymers for 193-nm excimer laser lithography

Roderick R. Kunz, Gregory M. Wallraff, Robert D. Miller, 1992, Advanced Lithography.

Materials evaluation of antireflective coatings for single-layer 193-nm lithography

Roderick R. Kunz, Robert D. Allen, 1994, Advanced Lithography.

High-resolution fluorocarbon-based resist for 157-nm lithography

Roderick R. Kunz, Roger F. Sinta, Michael Sworin, 2001, SPIE Advanced Lithography.

Immersion liquids for lithography in the deep ultraviolet

Roderick R. Kunz, Roger F. Sinta, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Comparison of etching tools for resist pattern transfer

Mark A. Hartney, Roderick R. Kunz, Mark W. Horn, 1992, Advanced Lithography.

Parametric optimization for enhanced sensitivity in a colorimetric chemical sensory

Roderick R. Kunz, Richard P. Kingsborough, Alexandra T. Wrobel, 2020, Defense + Commercial Sensing.

Performance of a phase-shift focus monitor reticle designed for 193-nm use

Roderick R. Kunz, Scott P. Doran, M. S. Chan, 1999, Advanced Lithography.

Protecting groups for 193-nm photoresists

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1996, Advanced Lithography.

Comparison of liquid- and vapor-phase silylation processes for 193-nm positive-tone lithography

Mark A. Hartney, Roderick R. Kunz, Douglas C. LaTulipe, 1993, Advanced Lithography.

Colourimetry for the sensitive detection of vapour-phase chemicals: State of the art and future trends

Roderick R. Kunz, Richard P. Kingsborough, Alexandra T. Wrobel, 2021 .

Surface Functionalization and Imaging Using Monolayers and Surface-Grafted Polymer Layers

Roderick R. Kunz, R. Kunz, Michael D. K. Ingall, 1999 .

Lithography with 157 nm lasers

Roderick R. Kunz, Theodore M. Bloomstein, Mordechai Rothschild, 1997 .

Comparison of liquid- and vapor-phase silylation processes for 193-nm positive-tone lithography

Mark A. Hartney, Roderick R. Kunz, Lynn M. Eriksen, 1993 .

Recent Trends in Optical Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2004 .

Large-area interdigitated array microelectrodes for electrochemical sensing

Roderick R. Kunz, Adam E. Cohen, A. Cohen, 2000 .

Single-layer chemically amplified photoresists for 193-nm lithography

Gregory Breyta, Roderick R. Kunz, Gregory M. Wallraff, 1993 .

Deep-UV Resist Technology: The Evolution of Materials and Processes for 250-nm Lithography and Beyond

Roderick R. Kunz, Robert D. Allen, Willard Earl Conley, 1997 .

Design Considerations for 193-nm Positive Resists

Donald C. Hofer, Roderick R. Kunz, Gregory M. Wallraff, 1995 .

Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists

Roderick R. Kunz, Gregory M. Wallraff, William D. Hinsberg, 1993 .

Extending optics to 50 nm and beyond with immersion lithography

Roderick R. Kunz, Roger F. Sinta, So-Yeon Baek, 2003 .

Polymer photochemistry at advanced optical wavelengths

Roderick R. Kunz, Roger F. Sinta, Theodore H. Fedynyshyn, 2000 .

A Novel Method for Remotely Detecting Trace Explosives

Roderick R. Kunz, Mordechai Rothschild, Stephen T. Palmacci, 2008 .

Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz, Vladimir Liberman, D. K. Downs, 2000 .

Dry development of sub‐0.25 μm features patterned with 193 nm silylation resist

Roderick R. Kunz, S. C. Palmateer, Mark W. Horn, 1996 .

Outlook for 157-nm Resist Designs

Roderick R. Kunz, Jane E. Curtin, Theodore M. Bloomstein, 1999 .

Resists and Other Critical Issues in 157-nm Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2000 .

Photolithography at 193 nm

D. C. Shaver, Mark A. Hartney, Roderick R. Kunz, 1992 .

Comparison of etching tools for resist pattern transfer

Mark A. Hartney, Roderick R. Kunz, Mark W. Horn, 1993 .

Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing

Roderick R. Kunz, Elsa Reichmanis, Allen H. Gabor, 1999 .

Outlook for 157 nm resist design

Roderick R. Kunz, Jane E. Curtin, Theodore M. Bloomstein, 1999 .

Applications of Lasers in Microelectronics and Micromechanics

Roderick R. Kunz, Theodore M. Bloomstein, Daniel J. Ehrlich, 1994 .

High resolution studies of crystalline damage induced by lapping and single-point diamond machining of Si(100)

Roderick R. Kunz, Mordechai Rothschild, H. Clark, 1996 .

Aluminum oxides as imaging materials for 193‐nm excimer laser lithography

Roderick R. Kunz, Stella W. Pang, Mordechai Rothschild, 1989 .

FURTHER DEVELOPMENTS IN SURFACE IMAGING RESISTS

Roderick R. Kunz, Mark W. Horn, Donald W. Johnson, 1993 .

Wet‐developed bilayer resists for 193‐nm excimer laser lithography

Roderick R. Kunz, Mark W. Horn, J. R. Eshelman, 1992 .

Critical issues in 157 nm lithography

Roderick R. Kunz, Theodore M. Bloomstein, Mordechai Rothschild, 1998 .

Liquid immersion lithography: Why, how, and when?

Roderick R. Kunz, Vladimir Liberman, Theodore M. Bloomstein, 2004 .

Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography

Roderick R. Kunz, Roger F. Sinta, Michael Sworin, 2004 .