Vladimir Liberman

发表

Experimental VUV absorbance study of fluorine-functionalized polystyrenes

Roderick R. Kunz, Roger F. Sinta, Michael Sworin, 2001, SPIE Advanced Lithography.

Marathon damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Andrew Grenville, 1997, Photomask Technology.

High fluence testing of optical materials for 193-nm lithography extensions applications

Vladimir Liberman, Paul Zimmerman, Mordechai Rothschild, 2010, Advanced Lithography.

157 nm: Deepest deep-ultraviolet yet

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 1999 .

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Advanced Lithography.

Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

Vladimir Liberman, Paul Zimmerman, Mordechai Rothschild, 2007, SPIE Advanced Lithography.

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Vladimir Liberman, Roger H. French, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Reshaping light: reconfigurable photonics enabled by broadband low-loss optical phase change materials

Vladimir Liberman, Tian Gu, Juejun Hu, 2019, Defense + Commercial Sensing.

Determination of optical properties of thin films and surfaces in 157-nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2000, Advanced Lithography.

Laser cleaning of optical elements in 157-nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2000, Advanced Lithography.

Reconfigurable all-dielectric metalens for diffraction-limited imaging

Vladimir Liberman, Fan Yang, Tian Gu, 2020, NanoScience + Engineering.

Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2004, SPIE Advanced Lithography.

Attenuating phase-shifting mask at 157 nm

Vladimir Liberman, Steven J. Spector, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Marathon testing of optical materials for 193-nm lithographic applications

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1999, Laser Damage.

Damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Chris K. Van Peski, 1998, Advanced Lithography.

Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz, Vladimir Liberman, D. K. Downs, 2000, Advanced Lithography.

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, 2000, Advanced Lithography.

157-nm pellicles: polymer design for transparency and lifetime

Roderick R. Kunz, Vladimir Liberman, Roger H. French, 2002, SPIE Advanced Lithography.

Damage testing of partial reflectors for 157-nm laser calorimeters

Vladimir Liberman, Marla L. Dowell, Christopher L. Cromer, 2002, SPIE Laser Damage.

Photo-induced changes in 157-nm optical coatings

Vladimir Liberman, Theodore M. Bloomstein, Andrew Grenville, 2004, SPIE Advanced Lithography.

Development and evaluation of 193nm immersion generation-three fluid candidates

Vladimir Liberman, Neal Lafferty, Bruce W. Smith, 2008, SPIE Advanced Lithography.

Review of technology for 157-nm lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2001, IBM J. Res. Dev..

Tunable VO2/Au hyperbolic metamaterial (Presentation Recording)

Vladimir Liberman, Mikhail A. Noginov, Brock Mendoza, 2015, SPIE NanoScience + Engineering.

Testing of optical materials for 193-nm applications

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Optics & Photonics.

Optical materials and coatings at 157 nm

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 1999, Advanced Lithography.

Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1999, Advanced Lithography.

Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Ambient effects on the laser durability of 157-nm optical coatings

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Controlled contamination studies in 193-nm immersion lithography

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2004, SPIE Advanced Lithography.

Reconfigurable photonics enabled by optical phase change materials (Conference Presentation)

Richard A. Soref, Vladimir Liberman, Tian Gu, 2018 .

UV cleaning of contaminated 157-nm reticles

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2001, SPIE Advanced Lithography.

Seismic barrier protection of critical infrastructure

Vladimir Liberman, Mordechai Rothschild, Robert Haupt, 2017, 2017 IEEE International Symposium on Technologies for Homeland Security (HST).

Controlled contamination of optics under 157-nm laser irradiation

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2001, SPIE Advanced Lithography.

High index 193 nm immersion lithography: the beginning or the end of the road

Bryan J. Rice, Vladimir Liberman, Paul Zimmerman, 2009, Advanced Lithography.

Fast, electrically tunable filters for hyperspectral imaging

Vladimir Liberman, Mordechai Rothschild, C. Gear, 2014, Defense + Security Symposium.

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Chris K. Van Peski, Kevin J. Orvek, 2001, SPIE Advanced Lithography.

Optical nanoscopy with contact microlenses overcomes the diffraction limit

Vladimir Liberman, Kenneth W. Allen, Nicholaos I. Limberopoulos, 2016 .

Reversible Switching of Optical Phase Change Materials Using Graphene Microheaters

Jing Kong, Vladimir Liberman, Tian Gu, 2019, 2019 Conference on Lasers and Electro-Optics (CLEO).

Large-Area Dense Plasmonic Nanoarrays for Surface Enhanced Raman Applications

Vladimir Liberman, Theodore M. Bloomstein, Ahmed Busnaina, 2010 .

Recent Trends in Optical Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2004 .

Permittivity evaluation of multilayered hyperbolic metamaterials: Ellipsometry vs. reflectometry

Vladimir Liberman, Mikhail A. Noginov, T. U. Tumkur, 2015 .

Time domain modeling of bi-anisotropic media and phase change materials with generalized dispersion (Conference Presentation)

Vladimir Liberman, Zhaxylyk A. Kudyshev, Juejun Hu, 2019, Metamaterials, Metadevices, and Metasystems 2019.

Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, 1999 .

Deep-UV microsphere-assisted ultramicroscopy

Vladimir Liberman, Mordechai Rothschild, Kenneth W. Allen, 2015, 2015 17th International Conference on Transparent Optical Networks (ICTON).

Rational design and optimization of plasmonic nanoarrays for surface enhanced infrared spectroscopy

Vladimir Liberman, Shyamsunder Erramilli, Ronen Adato, 2012, Optics express.

Tunable VO2/Au hyperbolic metamaterial

Vladimir Liberman, Mikhail A. Noginov, Srujana Prayakarao, 2016 .

Experimentation and modeling of organic photocontamination on lithographic optics

Roderick R. Kunz, Vladimir Liberman, D. K. Downs, 2000 .

Studies of consequences of photo-acid generator leaching in 193nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2006, SPIE Advanced Lithography.

Aluminum plasmonics: optimization of plasmonic properties using liquid-prism-coupled ellipsometry.

Vladimir Liberman, Mordechai Rothschild, D. M. Lennon, 2013, Optics express.

Resists and Other Critical Issues in 157-nm Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2000 .

Mid-infrared photothermal heterodyne spectroscopy in a liquid crystal using a quantum cascade laser.

Vladimir Liberman, Jerome Mertz, Shyamsunder Erramilli, 2012, Applied physics letters.

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Kevin J. Orvek, Mordechai Rothschild, 2001 .

Nonlinear bleaching, absorption, and scattering of 532-nm-irradiated plasmonic nanoparticles

Michael Sworin, Vladimir Liberman, Mordechai Rothschild, 2013 .

Super‐resolution microscopy by movable thin‐films with embedded microspheres: Resolution analysis

Vladimir Liberman, Kenneth W. Allen, Nicholaos I. Limberopoulos, 2015 .

Materials issues for optical components and photomasks in 157 nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 1999 .

Broadband transparent optical phase change materials

Vladimir Liberman, Jerome Michon, Anupama Yadav, 2017, 2017 Conference on Lasers and Electro-Optics (CLEO).

Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2007 .

Wafer-Scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition

Vladimir Liberman, Mordechai Rothschild, D. M. Lennon, 2016 .

Angle-and polarization-dependent collective excitation of plasmonic nanoarrays for surface enhanced infrared spectroscopy.

Vladimir Liberman, Shyamsunder Erramilli, Ronen Adato, 2011, Optics express.

Liquid immersion lithography: Why, how, and when?

Roderick R. Kunz, Vladimir Liberman, Theodore M. Bloomstein, 2004 .

Broadband transparent optical phase change materials for high-performance nonvolatile photonics

Vladimir Liberman, Anupama Yadav, Tian Gu, 2018, Nature Communications.

Prospects for photolithography at 121 nm

Vladimir Liberman, Mordechai Rothschild, Stephen T. Palmacci, 2002 .